METHOD OF PRODUCING TFT ARRAY SUBSTRATE FOR LIQUID CRYSTAL DISPLAY

摘要

An etching composition is provided to etch both a molybdenum-titanium alloy layer and an indium oxide layer effectively, to maximize an efficiency of an etching process, and to minimize an attack on a lower metal layer. A composition for etching a molybdenum-titanium alloy layer and an indium oxide layer includes 10-25wt% of H2O2, 0.1-2wt% of a fluorine-containing compound, 0.1-5wt% of a heterocyclic amine compound, and 68-90wt% of water, based on the total weight of the composition. A method for preparing a thin film transistor array substrate for a liquid crystal display includes a step of etching a molybdenum-titanium alloy layer or indium oxide layer using the etching composition.