| 摘要 |
An excimer laser irradiation apparatus is provided to improve the operating rate of a substrate processing apparatus by detecting an excimer lamp which run out the lifetime, and filling up insufficient laser output. An excimer laser irradiation apparatus(1) has a substrate transfer device(7) for transferring a substrate(13), and is installed at a substrate processing apparatus which processes the substrate by irradiating an excimer laser. The plural excimer lamps(2) are disposed to the vertical about the substrate transferring direction. A power supply controls the output of the excimer lamps independently. The excimer laser irradiation apparatus has a sensing function for sensing the laser output of each excimer lamp. And the excimer laser irradiation apparatus has a laser supplement function for filling up the laser output if the laser output from at least one excimer lamp is not reached to the standard output.
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