APPARATUS FOR CONTROLLING AN INTERVAL BETWEEN WAFERS, AND WAFER CLEANING MACHINE INCLUDING THE SAME

摘要

A device for controlling an interval between wafers and a substrate cleaning apparatus including the same are provided to maximize the effect of cleaning and drying a wafer by expanding the interval during a substrate cleaning process. Plural wafer support blocks(103a1) have wafer support grooves for fixing sheets of wafers. At least two support rods(102a,102b) penetrate the wafer support blocks to support the wafer support blocks. Plural air cylinders(110a1) are coupled to the wafer support blocks to expand or contract an intervals between the wafer support blocks. The wafer support block has a base member(106a1) and a lateral member(104a1) for supporting a lower edge and a side edge of the wafer. The air cylinder is coupled to the wafer support block via a coupling member(108a1).