METHOD OF SMOOTHING SURFACE OF SUBSTRATE FOR EUV MASK BLANK, AND EUV MASK BLANK OBTAINED BY ITS METHOD

摘要

PROBLEM TO BE SOLVED: To provide a method of smoothing the surface of a substrate for an EUV mask blank having concave defects such as pits and scratches.

SOLUTION: A method of smoothing the surface of a substrate for a reflective type mask blank for EUV lithography is characterized by smoothing the surface of a substrate having concave defects by applying a solution containing a polysilazane compound on the surface of the substrate having the concave defects and heating/curing it to form a silica coating (or a coating containing SiO2as a main skeleton).

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