| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and apparatus for efficiently drying a disk substrate having an aperture. SOLUTION: The method for drying a workpiece having an aperture includes the steps of dipping the work piece in a liquid, extracting the workpiece before the workpiece contacts the liquid by generating a relative movement between the workpiece and the liquid surface, and drying the workpiece. At least, part of the drying steps takes place while the relative movement is being generated. The relative movement corresponds to a first speed at which an upper part of the aperture passes on the liquid surface. Further, the relative movement corresponds to the second speed while the part of the workpiece is in contact with the liquid after the upper part of the aperture passes the liquid surface. The first speed is slower than the second one. COPYRIGHT: (C)2008,JPO&INPIT
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