发明名称 MANUFACTURING METHOD FOR GLASS SUBSTRATE FOR ELECTRONIC DEVICE, MANUFACTURING METHOD FOR MASK BLANKS, AND MANUFACTURING METHOD FOR TRANSFERRING MASK
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a manufacturing method for glass substrates for electronic devices free of generation of a minute, convex surface flaw at the substrate surface even through precision polishing. <P>SOLUTION: The manufacturing method to make precision polishing of the substrate surface in such an arrangement that a polishing pad is pressed to a the glass substrate 1 for electronic device and the pad and the glass substrate are put in relative movement while a polishing liquid containing abrasive grains is fed to between the pad 7 and glass substrate, includes a process to polish a dummy substrate before the precision polishing as main process is made while water or a solution of organic solvent is fed to between the pad and the dummy substrate, and in this process using the dummy substrate, a surface active agent contained in polishing the pad is removed so that the abrasive grains do attach to the glass substrate in the precision polishing process to not cause generation of minute convex surface flaws owing to reaction with the surface active agent contained in the polishing liquid and the polishing pad. <P>COPYRIGHT: (C)2008,JPO&INPIT</p>
申请公布号 JP2008114364(A) 申请公布日期 2008.05.22
申请号 JP20070279920 申请日期 2007.10.29
申请人 HOYA CORP 发明人 KOIKE KESAHIRO
分类号 B24B39/04;G03F1/24;G03F1/60 主分类号 B24B39/04
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