| 摘要 |
A feedstock supply unit for evaporating or sublimating feedstock and supplying the resulting vapor to a treatment vessel in vapor deposition equipment, which is equipped with a feedstock vessel for holding the feedstock, a gas introduction port for supplying a carrier gas to the inside of the feedstock vessel, and a gas discharge port for discharging the evaporated or sublimated feedstock together with the carrier gas in order to supply them to the treatment vessel, characterized in that the feedstock vessel is provided with a gas flow controller for controlling the flow of the carrier gas in the inside thereof.
|
