| 摘要 |
A composite film comprising a polymeric substrate and a planarising coating layer wherein the surface of the planarised substrate exhibits an Ra value of less than 0.7 run and/or an Rq value of less than 0.9 nm, and wherein the composite film further comprises a gas-permeation barrier deposited by atomic layer deposition on a planarised surface of the substrate; an electronic device comprising said composite film; and processes for the production thereof. |
