发明名称 |
AI-Ni-La system AI-based alloy sputtering target and process for producing the same |
摘要 |
The invention relates to an Al-Ni-La system Al-based alloy sputtering target comprising Ni and La, wherein, when a section from (1/4)t to (3/4)t (t: thickness) in a cross section vertical to a plane of the sputtering target is observed with a scanning electron microscope at a magnification of 2000 times, (1) a total area of an Al-Ni system intermetallic compound having an average particle diameter of 0.3 µm to 3 µm with respect to a total area of the entire Al-Ni system intermetallic compound is 70% or more in terms of an area fraction, the Al-Ni system intermetallic compound being mainly composed of Al and Ni; and (2) a total area of an Al-La system intermetallic compound having an average particle diameter of 0.2 µm to 2 µm with respect to a total area of the entire Al-La system intermetallic compound is 70% or more in terms of an area fraction, the Al-La system intermetallic compound being mainly composed of Al and La. |
申请公布号 |
EP1923479(A1) |
申请公布日期 |
2008.05.21 |
申请号 |
EP20070022142 |
申请日期 |
2007.11.14 |
申请人 |
KABUSHIKI KAISHA KOBE SEIKO SHO;KOBELCO RESEARCH INSTITUTE , INC. |
发明人 |
EHIRA, MASAYA;TAKAGI, KATSUTOSHI;KUGIMIYA, TOSHIHIRO;YONEDA, YOICHIRO;GOTOU, HIROSHI |
分类号 |
C23C14/34;C22C21/00;C23C4/12 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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