Treatment of effluent containing chlorine-containing gas

摘要

A substrate processing apparatus (100) comprises a process chamber (110) and an effluent treatment apparatus (300) comprising a hydrogenation reactor (310), scrubber (320), combustor (330), and a controller (200) to operate the process chamber and effluent treatment apparatus. In the hydrogenation reactor, hydrogen-containing gas is used to treat chamber effluent to form a hydrogenated effluent comprising hydrogen chloride gas. A scrubber sprays water through the hydrogenated effluent to dissolve the hydrogen chloride gas. An oxygen-containing gas is added to the treated effluent during a combustion step to further abate the effluent.