发明名称 Method for post-OPC multi layer overlay quality inspection
摘要 A method for performing post-optical proximity correction (OPC) multi layer overlay quality inspection includes the steps of generating a virtual target mask for a first mask and a second mask overlay using design rules at least partially defining the relationship between the first mask and the second mask; creating a composite aerial image representing a first mask image formed from the first mask and a second mask image formed by the second mask by performing imaging of the first mask and the second mask and overlaying the second mask image onto the first mask image; generating an overlay image map of the composite aerial image using the design rules at least partially defining the relationship between the first mask and the second mask; and comparing the overlay image map area and the virtual target mask area.
申请公布号 US7376260(B2) 申请公布日期 2008.05.20
申请号 US20040011384 申请日期 2004.12.14
申请人 LSI LOGIC CORPORATION 发明人 CALLAN NEAL;BELOVA NADYA
分类号 G06K9/00;G03F1/14;G03F7/20;G06T7/00 主分类号 G06K9/00
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