发明名称 |
Ribbon beam ion implanter cluster tool |
摘要 |
An ion implantation cluster tool for implanting ions into a workpiece is provided, wherein a plurality of beamline assemblies having a respective plurality of ion beamlines associated therewith are positioned about a common process chamber. Each of the plurality of ion beamline assemblies are selectively isolated from the common process chamber, and the plurality of beamline intersect at a processing region of the process chamber. A scanning apparatus positioned within the common process chamber is operable to selectively translate a workpiece holder in one or more directions through each of the plurality of ion beamlines within the processing region, and a common dosimetry apparatus within the common process chamber is operable to measure one or more properties of each of the plurality of ion beamlines. A load lock chamber is operably coupled to the common process chamber for exchange of workpieces between the common process chamber and an external environment.
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申请公布号 |
US7375355(B2) |
申请公布日期 |
2008.05.20 |
申请号 |
US20060432977 |
申请日期 |
2006.05.12 |
申请人 |
AXCELIS TECHNOLOGIES, INC. |
发明人 |
FERRARA JOSEPH;SPLINTER PATRICK R.;GRAF MICHAEL A.;BENVENISTE VICTOR M. |
分类号 |
H01J37/317 |
主分类号 |
H01J37/317 |
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