发明名称 |
Method and apparatus for providing uniform plasma in a magnetic field enhanced plasma reactor |
摘要 |
A method and apparatus for controlling a magnetic field gradient within a magnetically enhanced plasma reactor. The apparatus comprises a cathode pedestal supporting a wafer within an enclosure, a plurality of electromagnets positioned proximate the enclosure for producing a magnetic field in the enclosure and a magnetic field control element, positioned proximate the electromagnets, for controlling the magnetic field proximate a specific region of the wafer.
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申请公布号 |
US7374636(B2) |
申请公布日期 |
2008.05.20 |
申请号 |
US20020205870 |
申请日期 |
2002.07.26 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
HORIOKA KEIJI;YAN CHUN;SHIN TAEHO;LINDLEY ROGER ALAN;HUGHES PANYIN;BURNS DOUGLAS H.;LEE EVANS Y.;PU BRYAN Y.;LI QI;DAHIMENE MAHMOUD |
分类号 |
H01L21/306;C23C16/00;H01J37/32 |
主分类号 |
H01L21/306 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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