发明名称 Manufacturing method of semiconductor device
摘要 A semiconductor device in the form of a resin sealed semiconductor package is disclosed, wherein a gate terminal connected to a gate pad electrode formed on a surface of a semiconductor chip and a source terminal connected to a source pad electrode formed on the chip surface exposed to a back surface of a sealing resin portion, a first portion of a drain terminal connected to a back-surface drain electrode of the semiconductor chip is exposed to an upper surface of the sealing resin portion, and a second portion of the drain terminal formed integrally with the first portion of the drain terminal is exposed to the back surface of the sealing resin portion. When forming the sealing resin portion in such a semiconductor device, first the sealing resin portion is formed so as to also cover an upper surface of the first portion of the drain terminal and thereafter the upper surface side of the sealing resin portion is polished by liquid honing, thereby allowing the upper surface of the first portion of the drain terminal to be exposed on the upper surface of the sealing resin portion. Both heat dissipating property and production yield of the semiconductor device are improved.
申请公布号 US7374965(B2) 申请公布日期 2008.05.20
申请号 US20060348362 申请日期 2006.02.07
申请人 RENESAS TECHNOLOGY CORP. 发明人 MUTO AKIRA;SHIMIZU ICHIO;ARAI KATSUO;KAGII HIDEMASA;SATO HIROSHI;NAKAMURA HIROYUKI;NAKAJO TAKUYA;OKAWA KEIICHI;OSAKA MASAHIKO
分类号 H01L21/00 主分类号 H01L21/00
代理机构 代理人
主权项
地址