| 发明名称 |
Polymerizable compositions; polymer, resist, and lithography method |
| 摘要 |
A polymerizable composition for the production of a resist includes at least one unsaturated, polymerizable monomer. This monomer has at least one silicon atom and at least one carbonyl group.
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| 申请公布号 |
US7374858(B2) |
申请公布日期 |
2008.05.20 |
| 申请号 |
US20050520534 |
申请日期 |
2005.01.06 |
| 申请人 |
QIMONDA AG |
发明人 |
ELIAN KLAUS |
| 分类号 |
G03C1/492;C08F30/08;C08G77/26;G03C1/494;G03C1/76;G03C5/00;G03F7/039;G03F7/075 |
主分类号 |
G03C1/492 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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