APPARATUS FOR MANUFACTURING A SEMICONDUCTOR DEVICE

摘要

A semiconductor device manufacturing apparatus is provided to suppress generation of aluminum particles by forming an injection unit with ceramic. A process chamber(100) provides a space in which a plurality of substrates are processed. An injection unit(116,128) is installed in the inside of the process chamber. The injection unit is composed of ceramics. The injection unit inject a reactant including fluorine onto the substrates. The process chamber includes a boat(106) and a tube. The boat includes rods(104). A plurality of slots are formed at the rods in order to support the substrates of multiple stages. The tube is formed to surround the boat. The tube includes an opening lower part.