发明名称 |
SYSTEM AND METHOD FOR HIGH-ENERGY SPUTTERING USING RETURN CONDUCTORS |
摘要 |
A system and method for sputtering is described. One embodiment includes a sputtering system that includes a vacuum chamber; a gas box secured to the inner surface of the vacuum chamber; a plurality of return conductors engaged with the gas box, the plurality of return conductors extending through the vacuum chamber; and a plurality of seals configured to engage corresponding ones of the plurality of return conductors, the plurality of seal configured to maintain the vacuum inside the vacuum chamber.
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申请公布号 |
US2008110752(A1) |
申请公布日期 |
2008.05.15 |
申请号 |
US20060558230 |
申请日期 |
2006.11.09 |
申请人 |
STOWELL MICHAEL W;RUSKE MANFRED |
发明人 |
STOWELL MICHAEL W.;RUSKE MANFRED |
分类号 |
C23C14/00 |
主分类号 |
C23C14/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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