| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist-protecting membrane material having excellent water-repelling properties and water-sliding properties, and exhibiting excellent properties in the points of penetration of the water, and bleeding out of an additive in a resist in ArF liquid-immersion lithography, and to provide a resist-protecting membrane material enabling the protective membrane to be removed at developing process because of being alkali dissolvable. <P>SOLUTION: The polymer compound contains repeating units represented by general formulas (1a) and (1b), and has the weight average molecular weight within the range of 1,000-500,000. In the formulas, R<SP>1a</SP>and R<SP>1b</SP>are each H, F, an alkyl group or a fluorinated alkyl group; R<SP>2a</SP>, R<SP>2b</SP>, R<SP>3a</SP>and R<SP>3b</SP>are each H, an alkyl group or a fluorinated alkyl group; R<SP>2a</SP>and R<SP>2b</SP>, and R<SP>3a</SP>and R<SP>3b</SP>may form each a ring by binding to each other with a carbon atom bound thereto, and in the case, R<SP>2a</SP>and R<SP>2b</SP>, R<SP>3a</SP>and R<SP>3b</SP>forming the rings are each an alkylene group or a fluorinated alkylene group; 0<a<1; 0<b<1; a+b=1; and n is an integer of 1-4. <P>COPYRIGHT: (C)2008,JPO&INPIT |
