| 摘要 |
A method and an apparatus for drying a substrate are provided to improve dry performance by efficiently drying treatment liquid over the entire surface of a substrate, and save energy by reducing air and power used. In a substrate drying apparatus, transfer speed of a substrate(G) is controlled to first speed when a front end area(Ga) and a rear end area(Gb) of the substrate reach a predetermined position spouting air to the substrate, and controlled to second speed higher than the first speed after the front end area and the rear end area of the substrate pass the predetermined position. |
