A chuck having heating and cooling functions is provided to enhance efficiency in a manufacturing process by performing a heating operation and a cooling operation therein. A chuck includes a wafer loading unit(210) and a supporting unit for supporting the wafer loading unit. A wafer is loaded on the wafer loading unit. The wafer loading unit includes a heating path(215) and a cooling path(217). The supporting unit includes at least one heating line(235) and at least one cooling line(237). The heating line is used for supplying current to the heating path. The cooling line is used for transferring a cooling agent from the outside through the cooling path to the outside. The cooling path is positioned at an upper part of the heating path.
申请公布号
KR20080041893(A)
申请公布日期
2008.05.14
申请号
KR20060110064
申请日期
2006.11.08
申请人
ATTO CO., LTD.
发明人
KO, SUNG KEUN;JOO, KWANG SUL;KIM, JONG HO;PARK, JONG OH;WOO, JUNG SIK;KIM, YOUNG HYO;KIM, HO SIK