| 摘要 |
<p>An exposure apparatus and a method for manufacturing a device are provided to implement high throughput and an exact doze control by lighting a reticle with a lighting beam from a light source and projecting the light from the corresponding reticle to a substrate. A shutter(4) is arranged on a path of a lighting beam. A detector detects doze with respect to a substrate(3). A controller(13) controls an operation of the shutter. The controller controls an opening time based on the output from the detector and memorizes the opening time in a first exposure mode using a light beam having first optical intensity. The controller controls a speed of the shutter on the basis of the memorized opening time in a second exposure mode using the lighting beam having second optical intensity greater than the first optical intensity. The controller controls the opening time in the first exposure mode with respect to at least one leading substrate of a lot including plural substrates. The controller controls a speed in the second exposure mode with respect to a substrate after the leading substrate.</p> |
