发明名称 |
Method and Apparatus For Removing Particles in Immersion Lithography |
摘要 |
A method and system involve supplying an immersion fluid to a space between an imaging lens and a substrate to be patterned, generating an electric field in the immersion fluid within the space so that the electric field urges particles away from a surface of the substrate, removing the immersion fluid along with the particles from the space, and thereafter supplying immersion fluid to the space and performing a lithographic exposing process on the surface of the substrate.
|
申请公布号 |
US2008106709(A1) |
申请公布日期 |
2008.05.08 |
申请号 |
US20060556550 |
申请日期 |
2006.11.03 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
CHANG HSIN;FU TZUNG-CHI;GAU TSAI-SHENG |
分类号 |
G03B27/52 |
主分类号 |
G03B27/52 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|