发明名称 GAN SINGLE-CRYSTAL SUBSTRATE AND METHOD FOR PROCESSING SURFACES OF GAN SINGLE-CRYSTAL SUBSTRATE
摘要 A GaN single-crystal substrate and a method for processing surfaces of the same are provided to enhance production efficiency by preventing warpage. A GaN single-crystal substrate(110) is formed by performing a double-sided polishing process. When a transmittance of the GaN single-crystal substrate is measured by using light having a wavelength range of 370-800 nm, the transmittance of the substrate is 65-90 percent. The GaN single-crystal substrate is characterized in that the light to be irradiated to the GaN single-crystal substrate is from ultraviolet light to infrared light to measure the transmittance of the GaN single-crystal substrate.
申请公布号 KR20080040115(A) 申请公布日期 2008.05.08
申请号 KR20060107664 申请日期 2006.11.02
申请人 SAMSUNG CORNING PRECISION GLASS CO., LTD. 发明人 JEONG, JIN SUK;LEE, KI SOO;KIM, KYOUNG JUN;LEE, JU HEON;JIN, CHANG UK
分类号 C30B29/38;C30B33/00;H01L33/32 主分类号 C30B29/38
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