发明名称 |
GAN SINGLE-CRYSTAL SUBSTRATE AND METHOD FOR PROCESSING SURFACES OF GAN SINGLE-CRYSTAL SUBSTRATE |
摘要 |
A GaN single-crystal substrate and a method for processing surfaces of the same are provided to enhance production efficiency by preventing warpage. A GaN single-crystal substrate(110) is formed by performing a double-sided polishing process. When a transmittance of the GaN single-crystal substrate is measured by using light having a wavelength range of 370-800 nm, the transmittance of the substrate is 65-90 percent. The GaN single-crystal substrate is characterized in that the light to be irradiated to the GaN single-crystal substrate is from ultraviolet light to infrared light to measure the transmittance of the GaN single-crystal substrate.
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申请公布号 |
KR20080040115(A) |
申请公布日期 |
2008.05.08 |
申请号 |
KR20060107664 |
申请日期 |
2006.11.02 |
申请人 |
SAMSUNG CORNING PRECISION GLASS CO., LTD. |
发明人 |
JEONG, JIN SUK;LEE, KI SOO;KIM, KYOUNG JUN;LEE, JU HEON;JIN, CHANG UK |
分类号 |
C30B29/38;C30B33/00;H01L33/32 |
主分类号 |
C30B29/38 |
代理机构 |
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