HETARYL CARBON ACID-N-(BIPHEN-2-YL)AMIDE COMPOUNDS

摘要

The present invention relates to hetaryl carbon acid-N-(biphen-2-yl) compounds, the use thereof for controlling harmful fungi, fungicidal substances comprising said compounds, and method for controlling harmful fungi, wherein m stands for 0, 1, 2, 3 or 4, n for 0, 1 or 2, R for C₁-C₄-alkyl or C₁-C₄-halogen alkyl or n = 2 can also stand for NH_2;Hal for halogen, particularly for fluoride or chlorine, and A for a heteroaromatic remainder, chosen from the remainders of the common formula A.1, A.2, and A.3, wherein ^{R1stands for methyl or halogen methyl, R2 for carbon, fluoride or chlorine , R3 for carbon, chlorine, methyl or trifluormethyl, R4 for carbon, fluoride, chlorine, methyl or trifluormethyl; and R5 for fluoride, chlorine, methyl, difluourmethyl, trifluormethyl or methoxy; and the salts thereof, except compounds, wherein the group S(O)_n-R stands for a thio-C₁-C₄-alkyl group, that is bound in the 4'-position of the biphenyl unit, when A stands for a remainder A.2 or a remainder A.3.}