发明名称 AMORPHOUS METAL FILM AND PROCESS FOR APPLYING SAME
摘要 <p>Ni-based refractory metallic glass coatings utilizing periodic table grou p five element vanadium in combination with other group 5 or 6 elements, par ticularly tantalum, chromium, or molybdenum, can be formed via co-sputtering with proper control of carrier gas pressure and/or bias voltage. The alloy forms fully amorphous coatings that are not predicted by the usual glass for ming ability (GFA) criteria. These alloys exhibit high thermal stability, ha rdness values greater than TiN, smooth surface finishes, and a wide processi ng window.</p>
申请公布号 CA2674646(A1) 申请公布日期 2008.05.08
申请号 CA20062674646 申请日期 2006.09.08
申请人 BILELLO, JOHN C. 发明人 BILELLO, JOHN C.
分类号 B32B15/00 主分类号 B32B15/00
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