| 摘要 |
<p>A high-aperture ratio LCD device and a manufacturing method thereof are provided to form an organic layer previously before forming a gate line, remove a part of the organic layer to form a hollow on the organic layer, and form the gate line along the hollow, thereby reduce the width of a black matrix through a non-stepped structure formed with a next line to obtain the brightness of high efficiency through the maximization of an opening portion. A method for manufacturing an LCD(Liquid Crystal Display) device comprises the following steps of: preparing a substrate; defining a switching area, a gate area, a data area, and a pixel area on the substrate(100); forming a transparent organic layer(115) on the front of the substrate; forming hollow with a certain depth on the transparent organic layer corresponding to the gate area; coating conductive metal along the hollow formed on the transparent organic layer; etching the conductive metal to form a gate line(120) and a gate electrode(136) in a direction; forming a gate insulating layer(125) on the front of the upper part of the substrate on which the gate electrode and the gate line are formed; forming pure and impure amorphous silicon layers(145,146) in the upper part of the gate insulating layer successively; forming a data line, a source electrode(132) extended from the data line, and a drain electrode(134) spaced from the source electrode in correspondence to the data area in the upper part of the pure and impure amorphous silicon layers; forming a passivation layer(155) on the front of the substrate on which the source and drain electrodes and the data line are formed; and forming a pixel electrode(150) which is in contact with the drain electrode in correspondence to the pixel area through a drain contact hole(CH2) exposing a part of the drain electrode.</p> |
