发明名称 |
Polymer for forming anti-reflective coating layer |
摘要 |
A polymer for forming an organic anti-reflective coating layer between an etching layer and a photoresist layer to absorb an exposure light in a photolithography process and a composition comprising the same are disclosed. The polymer for forming an organic anti-reflective coating layer has a repeating unit represented by wherein, R<SUB>1 </SUB>is hydrogen or methyl group, and R<SUB>2 </SUB>is a substituted or non-substituted alky group of C1 to C5. The composition for forming the organic anti-reflective coating layer includes the polymer having the repeating unit represented by above Formulas; a light absorber; and a solvent.
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申请公布号 |
US7368219(B2) |
申请公布日期 |
2008.05.06 |
申请号 |
US20050312788 |
申请日期 |
2005.12.20 |
申请人 |
DONGJIN SEMICHEM CO., LTD. |
发明人 |
KIM SANG-JUNG;KIM JONG-YONG;KIM DEOG-BAE;KIM JAE-HYUN |
分类号 |
G03C1/76 |
主分类号 |
G03C1/76 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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