MONOMER HAVING SULFONYL GROUP, POLYMER THEREOF AND PHOTORESIST COMPOSITION INCLUDING THE SAME

摘要

A photoresist monomer having a sulfonyl group, a polymer thereof and a photoresist composition containing the same are disclosed. The photoresist monomer is represented by following Formula. wherein, R* is a hydrogen atom or a methyl group, R₁ and R₂ are independently a C₁~C₂₀ alkyl group, a C₄~C₂₀ cycloalkyl group, a C₆~C₂₀ aryl group or a C₇~C₂₀ arylalkyl group, one of R₁ and R₂ may not exist, and R₁ and R₂ can be connected to form a ring.