发明名称 ACTIVE MATRIX SUBSTRATE, ELECTRO-OPTICAL DEVICE, INSPECTION METHOD AND METHOD FOR MANUFACTURING ELECTRO-OPTICAL DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide an active matrix substrate capable of reducing alignment time for inspection and minimizing waste of products judged as defective by inspection. <P>SOLUTION: The active matrix substrate 20 includes mounting terminals 26 connected to a plurality of scanning lines WL and a plurality of data lines DL, an inspection circuit 30, and inspection terminals 32 connected to the inspection circuit 30 and being in a smaller number with a wider pitch and a larger area than the mounting terminals 26. In first and second inspection steps, the substrate is inspected by connecting an inspection device 100 to the inspection circuit 30 disposed on the active matrix substrate 20; and in a cutting step, the substrate 20 and a plurality of inspection wiring lines 28 are cut at a position between the plurality of mounting terminals 26 and the inspection circuit 30. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008102335(A) 申请公布日期 2008.05.01
申请号 JP20060285119 申请日期 2006.10.19
申请人 SEIKO EPSON CORP 发明人 NOZAWA TAKESHI;KITAZAWA SACHIYUKI
分类号 G09F9/30;G01M11/00;G01R31/00;G02F1/13;G02F1/1368;G09F9/00;G09G3/20;G09G3/30;G09G3/36;H01L51/50;H05B33/10;H05B33/12 主分类号 G09F9/30
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