| 摘要 |
<p>A reticle manufacturing method and a reticle structure are provided to obtain the enhanced resolution power of an isolated pattern without using a high-grade mask, by patterning an isolated space region with a layer having low transmittance of 10 to 20% for a light. A reticle manufacturing method for enhancing resolving power in patterning an isolated space comprises the steps of: forming a low transmittance layer and a light shielding layer(30) on a quartz substrate(10), wherein the low transmittance layer comprises the first low transmittance layer(21) with a large pattern and the second low transmittance layer(22) with a narrow pattern; patterning the light shielding layer; patterning the low transmittance layer; and selectively removing the light shielding layer from an isolated space region.</p> |
