| 摘要 |
<p>An integrated method for removing halogen residues from an etched chamber through a thermal process is provided to prevent the corrosion and pollution of a process system due to exhausted halogens by using a halogen-containing residual removing process selected at en-route. A process system(100) having a vacuum airtight platform(104) is provided. A substrate(124) is processed in process chambers(110,112,132,128,120) with chemicals including halogen. The processed substrate is treated in the platform to exhaust volatile residues. When the processed substrate is treated, it is heated while it is in a load lock chamber(122) of the platform. When the processed substrate is treated, it is heated on a blade of a robot arranged on the platform. When the processed substrate is treated, it is heated in a transfer chamber(136) coupled to the process chamber.</p> |
