| 发明名称 |
Process for the production of a chip by using immersion lithography |
| 摘要 |
<p>The invention relates to a process for the production of a chip by using immersion lithography, comprising the step of forming a photoresist layer on a substrate, wherein the photoresist layer is prepared from a photoresist composition comprising:
(a) a binder;
(b) a photoactive component.
(c) a fluor containing compound.</p> |
| 申请公布号 |
EP1914596(A2) |
申请公布日期 |
2008.04.23 |
| 申请号 |
EP20070024032 |
申请日期 |
2004.07.21 |
| 申请人 |
DSM IP ASSETS B.V. |
发明人 |
SHAHAB, JAHROMI;DERKS, FRANCISCUS JOHANNES MARIE;LYAPUNOV, ANDREY YAROSLAVOVICH |
| 分类号 |
G03F7/004;G03F7/039;G03F7/20 |
主分类号 |
G03F7/004 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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