发明名称 METHOD FOR MANUFACTURING A WAFER LEVEL PACKAGE USING A SEALING LAYER FOR METAL LINE
摘要 A method for manufacturing a wafer level package using a sealing layer for metal line is provided to shorten a manufacturing time and to reduce a manufacturing cost by manufacturing a semiconductor package without using a raw material such as a substrate or a wire. A sealing layer(306) for metal line including a thermoplastic resin and a metal compound is formed on a surface of a wafer including a plurality of semiconductor chips(302). A via hole for exposing a pad of the semiconductor chip is formed by melting the sealing layer for metal line. A metal seed layer for metal line is formed by melting the sealing layer for wiring by using a laser. An electrode and circuit line layer(314) is formed on a surface of the sealing layer for metal line by using the metal seed layer. A solder ball(316) is attached on the electrode and circuit line layer.
申请公布号 KR100824542(B1) 申请公布日期 2008.04.23
申请号 KR20070023653 申请日期 2007.03.09
申请人 STS SEMICONDUCTOR & TELECOMMUNICATIONS CO., LTD. 发明人 PARK, MIN SUH
分类号 H01L23/48;H01L21/60 主分类号 H01L23/48
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