A METHOD OF MAKING SEMICONDUCTOR INTEGRATED CIRCUIT,申请号KR20020031971-传众专利搜索

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发明名称	A METHOD OF MAKING SEMICONDUCTOR INTEGRATED CIRCUIT
摘要
申请公布号	KR100823821(B1)	申请公布日期	2008.04.21
申请号	KR20020031971	申请日期	2002.06.07
申请人		发明人
分类号	H01L27/092;H01L21/265;H01L21/266;H01L21/8238;(IPC1-7):H01L27/092	主分类号	H01L27/092
代理机构		代理人
主权项
地址

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