发明名称 SUBSTRATE SUPPORTING STAGE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a substrate supporting stage capable of correctly reproducing the profile configuration of the substrate supporting stage at a low cost and capable of forming an air nozzle without requiring a high technology and high cost, further, capable of preventing the breakage of the stage or the come-off of a jig caused by the difference of an amount of expansion even if there is a temperature change. <P>SOLUTION: The substrate supporting stage 12 supports a substrate by levitating the substrate at a predetermined height by air jetted out of a plurality of air nozzles 20 having an opening at the upper surface thereof in a substrate treatment device which treats the substrate sequentially while conveying the substrate into a given direction. This stage is formed by molding a material including an aggregate, a binder and a filler. <P>COPYRIGHT: (C)2008,JPO&INPIT</p>
申请公布号 JP2008084982(A) 申请公布日期 2008.04.10
申请号 JP20060261367 申请日期 2006.09.26
申请人 YOSHIDA FOUNDRY:KK 发明人 YOSHIDA TAKATOSHI
分类号 H01L21/683;B65G51/03 主分类号 H01L21/683
代理机构 代理人
主权项
地址