APPARATUS AND METHOD OF TREATING SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a technique capable of effectively acting microbubbles or nanobubbles with respect to a substrate in an apparatus and method for treating a substrate using a treatment liquid containing microbubbles or nanobubbles. SOLUTION: A microbubble cleaning part 40 controls a flow rate of nitrogen gas injected into a force-fed cleaning liquid, so as to control the size of the microbubbles. This can supply the large amount of microbubbles of the optimal size according to the size of particles to be removed, thereby causing the microbubbles to act effectively on the substrate. COPYRIGHT: (C)2008,JPO&INPIT