发明名称 VACUUM DEPOSITION SYSTEM
摘要 PROBLEM TO BE SOLVED: To solve the problem of vapor by making the distance between a target and a feed port of vapor freely controllable, and further, to achieve satisfactory vapor deposition without depending on spacing. SOLUTION: Regarding the vacuum deposition system, a flexible pipe whose inside is stored with a crucible and a vapor guide pipe whose bottom part is arranged with the same is fixed to a chamber so as to be sealed, and further, a vapor feed structure is provided. The vapor feed structure has a mechanism for controlling the length of the flexible pipe, and, by the length controlling mechanism, the distance between the tip of the vapor guide pipe and the target is made controllable. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008081809(A) 申请公布日期 2008.04.10
申请号 JP20060264432 申请日期 2006.09.28
申请人 NATIONAL INSTITUTE FOR MATERIALS SCIENCE 发明人 WAKAYAMA YUTAKA;SASAKI HIROYUKI;CHIKYO TOYOHIRO
分类号 C23C14/24 主分类号 C23C14/24
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