发明名称 IMPROVED PLASMA ELECTRODE
摘要 <p>An improved electrode (44) useful for modifying a substrate using corona or plasma treatment or coating a substrate using plasma enhanced chemical vapor deposition under atmospheric or near atmospheric pressure conditions, the electrode comprising a body (10) defining at least a first cavity therein, the body having at least one inlet passageway (12) therein in gaseous communication with the first cavity (11) so that a gas mixture can be flowed into the first cavity by way of the at least one inlet passageway (12), the electrode having at least one outlet passageway (43) therein in gaseous communication with the first cavity so that a gas that is flowed into the first cavity can flow out of the cavity by way of the at least one outlet passageway. The improvement of the instant invention requires that the at least one outlet passageway be a slot (43) and that the body (10) include at least a first removable portion thereof, one edge of the first removable portion (30, 31) defining one side of the at least one outlet passageway (43).</p>
申请公布号 WO2008042128(A1) 申请公布日期 2008.04.10
申请号 WO2007US20512 申请日期 2007.09.21
申请人 DOW GLOBAL TECHNOLOGIES, INC.;HALEY, ROBERT, P., JR.;SEMER, MARK, J. 发明人 HALEY, ROBERT, P., JR.;SEMER, MARK, J.
分类号 H01J37/32 主分类号 H01J37/32
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