METHOD AND DEVICE FOR MULTI-CATHODE-PVD-COATING AND SUBSTRATE HAVING PVD-COATING

摘要

The invention relates to a method for operating a multi-cathode-PVD-coating system. According to the invention, one part of the cathodes operates after the high power impulse cathodic sputtering which is assisted by magnetic fields and the remainder operates after the direct current magnetic field assisted cathodic sputtering. The high power impulse cathodic sputtering which is assisted by magnetic fields is used as a source of multi-ionised metal ions during the ion-assisted in vacuo pre-treatment of substrates, whilst both types of cathodic sputtering are always used simultaneously during coating and whilst both types of cathodes are connected to different materials.