发明名称 |
Method for adjusting lithographic mask flatness using thermally induced pellicle stress |
摘要 |
A method for adjusting the flatness of a lithographic mask includes determining an initial mask flatness of the mask, determining an applied stress for bringing the mask to a desired mask flatness, and determining a mounting temperature of a pellicle frame to be mounted to the mask, the mounting temperature corresponding to the applied stress. The actual temperature of the pellicle frame is adjusted to the determined mounting temperature.
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申请公布号 |
US7355680(B2) |
申请公布日期 |
2008.04.08 |
申请号 |
US20050905453 |
申请日期 |
2005.01.05 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
GALLAGHER EMILY F.;KINDT LOUIS M.;SLINKMAN JAMES A.;WISTROM RICHARD E. |
分类号 |
G03B27/62;G03F9/00 |
主分类号 |
G03B27/62 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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