发明名称 TRANSISTORS HAVING BURIED P-TYPE LAYERS COUPLED TO THE GATE AND METHODS OF FABRICATING THE SAME
摘要 A unit cell of a metal-semiconductor field-effect transistor (MESFET) is provided. The MESFET has a source, a drain and a gate. The gate is between the source and the drain and on an n-type conductivity channel layer. A p-type conductivity region is provided beneath the gate between the source and the drain. The p-type conductivity region is spaced apart from the n-type conductivity channel layer and electrically coupled to the gate. Related methods are also provided herein.
申请公布号 US2008079036(A1) 申请公布日期 2008.04.03
申请号 US20060536143 申请日期 2006.09.28
申请人 CREE, INC. 发明人 SRIRAM SAPTHARISHI;WILLIS MATT
分类号 H01L31/112;H01L21/28 主分类号 H01L31/112
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