发明名称 |
Method and apparatus for designing fine pattern |
摘要 |
Provided are a method and apparatus for designing a fine pattern that can be entirely transferred onto an object. The method includes reading the original data of a fine pattern for exposure. The fine pattern is divided into a first pattern not requiring revision and a second pattern requiring revision. The fine pattern is revised by forming an auxiliary pattern maintaining a first distance D1 from the second pattern. A fine pattern to be transferred onto a target object is estimated by running an emulation program including a first auxiliary pattern and a second auxiliary pattern. The estimated fine pattern is compared to the original data of the fine pattern for exposure, and the revised fine pattern is designated as a final fine pattern if there is no difference between the estimated fine pattern and the original data of the fine pattern for exposure.
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申请公布号 |
US2008082954(A1) |
申请公布日期 |
2008.04.03 |
申请号 |
US20060590399 |
申请日期 |
2006.10.31 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
SHIN JAE-PIL;KIM YOUNG-ILE;YOO MOON-HYUN;LEE JONG-BAE |
分类号 |
G06F17/50;G03F1/00;G03F1/68;H01L21/027 |
主分类号 |
G06F17/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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