METHOD OF MANUFACTURING CRYSTALLINE SILICON SOLAR CELLS WITH IMPROVED SURFACE PASSIVATION
摘要
The present invention provides a method of manufacturing a crystalline silicon solar cell, comprising: - providing a crystalline silicon substrate having a front side and a back side; - forming a thin silicon oxide film on at least one of the front and the back side by soaking the crystalline silicon substrate in a chemical solution; - forming a dielectric coating film on the thin silicon oxide film on at least one of the front and the back side. The thin silicon oxide film may be formed with a thickness of 0.5-10 nm. By forming a oxide layer using a chemical solution, it is possible to form a thin oxide film for surface passivation wherein the relatively low temperature avoids deterioration of the semiconductor layers.
申请公布号
WO2008039067(A2)
申请公布日期
2008.04.03
申请号
WO2007NL50459
申请日期
2007.09.20
申请人
ECN ENERGIEONDERZOEK CENTRUM NEDERLAND;KOMATSU, YUJI;GEERLIGS, LAMBERT, JOHAN;MIHAILETCHI, VALENTIN, DAN
发明人
KOMATSU, YUJI;GEERLIGS, LAMBERT, JOHAN;MIHAILETCHI, VALENTIN, DAN