| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a composition for resist underlayer films capable of forming a resist underlayer film excellent in adhesion to a resist film, improving the reproducibility of a resist pattern and having resistance to an alkaline liquid used for development and to oxygen ashing in resist removal, and excellent in storage stability. <P>SOLUTION: The composition for resist underlayer films contains (A) a polysiloxane having neither cyclic alkylene oxide group nor group represented by the structural formula [I]: -Ra-O-Rb and (B) a compound having a cyclic alkylene oxide group and/or a group represented by the structural formula [I], wherein Ra represents a methylene group, a 2-6C alkylene group, a phenylene group or CO; and Rb represents H or a thermally decomposable group. <P>COPYRIGHT: (C)2008,JPO&INPIT |
