发明名称 |
System And Method For Removing Contaminants |
摘要 |
The invention provides a system and method comprising an apparatus for removing contaminants from a gas in a semiconductor processing device, which can include a filter unit having at least two parallel filter stages located therein. The filter stages are designed to remove a least a portion of the contaminants present in the gas flowing through them. The apparatus can also include a flow controller for distributing the gas flow among the filter stages. In one embodiment, the controller may consist of a diffuser plate. The invention also provides a sampling tube orifice for gas flow control in a system or method of the invention. In another embodiment, an apparatus for removing contaminants from a gas in a clean room comprises a filter unit having at least two parallel filter stages, which are used to remove a portion of the contaminants in the gas as it passes through the apparatus.
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申请公布号 |
US2008078289(A1) |
申请公布日期 |
2008.04.03 |
申请号 |
US20050628576 |
申请日期 |
2005.06.07 |
申请人 |
SERGI JOHN E;GAUDREAU JOHN;KISHKOVICH OLEG P;GOODWIN WILLIAM;KINKEAD DEVON A |
发明人 |
SERGI JOHN E.;GAUDREAU JOHN;KISHKOVICH OLEG P.;GOODWIN WILLIAM;KINKEAD DEVON A. |
分类号 |
B01D53/04;B01D46/12;F24F3/16;G01N1/22;G01N7/00;G01N30/00 |
主分类号 |
B01D53/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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