| 摘要 |
This invention relates to organometallic compounds represented by the formula (L<SUB>1</SUB>)<SUB>y</SUB>M(L<SUB>2</SUB>)<SUB>z-y</SUB> wherein M is a Group 5 metal or a Group 6 metal, L<SUB>1</SUB> is a substituted or unsubstituted anionic 6 electron donor ligand, L<SUB>2</SUB> is the same or different and is (i) a substituted or unsubstituted anionic 2 electron donor ligand, (ii) a substituted or unsubstituted cationic 2 electron donor ligand, or (iii) a substituted or unsubstituted neutral 2 electron donor ligand; y is an integer of 1, and z is the valence of M; and wherein the sum of the oxidation number of M and the electric charges of L<SUB>1</SUB> and L<SUB>2</SUB> is equal to 0.; a process for producing the organometallic compounds; and a method for depositing a metal and/or metal carbide/nitride layer on a substrate by the thermal or plasma enhanced dissociation of the organometallic precursor compounds. |
| 申请人 |
PRAXAIR TECHNOLOGY, INC.;THOMPSON, DAVID, M.;PETERS, DAVID, WALTER;MEIERE, SCOTT, HOUSTON |
发明人 |
THOMPSON, DAVID, M.;PETERS, DAVID, WALTER;MEIERE, SCOTT, HOUSTON |
