| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist protective film forming composition which hardly damages a resist film, allows a resist pattern of a good rectangular shape to be formed, and can be used without restriction even when a resin of any structure is used as a resin in a resist composition, and a resist pattern forming method using the resist protective film forming composition. <P>SOLUTION: The protective film forming composition comprises (a) an alkali-soluble polymer and (b) an ether solvent. The resist pattern forming method using the protective film forming composition is also provided. <P>COPYRIGHT: (C)2008,JPO&INPIT |
