发明名称 |
APPARATUS OF MANUFACTURING SEMICONDUCTOR APPARATUS, AND METHOD OF MANUFACTURING SEMICONDUCTOR APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus of manufacturing a semiconductor apparatus without using a stepper in a manufacturing process when semiconductor apparatus are produced in high volume using a substrate having a large area. SOLUTION: By selectively radiating a laser beam to a thin film formed on a substrate having an insulated surface via a light control means, in particular, via an electro-optic apparatus and by generating ablation, the thin film is partially removed, and the remaining region of the thin film is made in a predetermined shape. The electro-optic apparatus inputs an electrical signal based on a design CAD data of a semiconductor apparatus to function as a variable mask. COPYRIGHT: (C)2008,JPO&INPIT
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申请公布号 |
JP2008078637(A) |
申请公布日期 |
2008.04.03 |
申请号 |
JP20070215736 |
申请日期 |
2007.08.22 |
申请人 |
SEMICONDUCTOR ENERGY LAB CO LTD |
发明人 |
TANAKA KOICHIRO;YAMAZAKI SHUNPEI |
分类号 |
H01L21/302;H01L21/28;H01L21/3213;H01L21/336;H01L29/786 |
主分类号 |
H01L21/302 |
代理机构 |
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