Optical system e.g. lighting system, for microlithography system, has optical unit supported by retaining units, and actuator incorporating force and/or moment to trigger isotropy-stress voltages to produce voltage birefringence in unit

摘要

The system has a set of optical units (32, 34, 36, 38) with a local optical axis (40), where a manipulator is attached to the optical unit (32). The manipulator has retaining units that are arranged at a periphery of the optical unit (32). An actuator e.g. piezo unit, attached to one retaining unit incorporates forces and/or moments into the optical unit (32). The optical unit (32) is supported by the retaining units, where the force and/or moment are incorporated by the actuator such that isotropy-stress voltages are triggered for producing voltage birefringence in the optical unit (32). An independent claim is also included for a method for improving imaging characteristics in a microlithography system with an optical system.