| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma treatment apparatus capable of plasma treatment at ambient pressure without using a chamber for plasma treatment. <P>SOLUTION: While operating the plasma treatment apparatus to irradiate an object 4 on a treatment table 1 with plasma from a plasma ejection port 6, gases which are jetted from a gas jet port 8 into a space formed between a plasma irradiation head 2 and the treatment table, as well as gases plasma-treated by the plasma from the plasma ejection port are exhausted from first and second gas exhaust ports 7 and 9 through a gas exhaust pipe 17, passed through a liquid nitrogen trap 18, purified, then appropriately mixed with new gases supplied from a gas source 20, passed from an air mover means 19 through a gas supply pipe 16, and jetted again from the gas jet port 8 into the space to surround the plasma ejection port with the plasma irradiation head, the treatment table, and a curtain of a gas flow. <P>COPYRIGHT: (C)2008,JPO&INPIT |
